Reverse conducting-insulated gate bipolar transistor
AssigneeKabushiki Kaisha Toshiba
InventorsToshiaki KOBAYASHI, Masakazu Kobayashi
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AssigneeKabushiki Kaisha Toshiba
InventorsToshiaki KOBAYASHI, Masakazu Kobayashi
Estimating the term…
According to one embodiment, in a reverse conducting-insulated gate bipolar transistor, the buffer layer is provided on the backside of the second base layer, has a higher impurity concentration in comparison with the second base layer. The first collector layer is in contact with a portion of the backside of the buffer layer, has a higher impurity concentration in comparison with the second base layer. The second collector layer is in contact with a portion of the backside of the buffer layer, is provided so as to surround the first collector layer, has a higher impurity concentration in comparison with the first base layer. The third collector layer is in contact with a portion of the backside of the buffer layer, is provided so as to surround the second collector layer, has a higher impurity concentration in comparison with the second collector layer.
A reverse conducting-insulated gate bipolar transistor, comprising:
A reverse conducting-insulated gate bipolar transistor, comprising:
Dependencies are inferred from the claim text.