Method for washing device substrate
AssigneesNTT Advanced Technology Corporation, Asahi Glass Company, Limited
InventorsHidekazu Okamoto, Hideo Namatsu
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Abstract
The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. A method for washing a device substrate, which comprises a washing step of removing a resist attached to a device substrate by means of a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon and a perfluorocarbon, and a fluorinated alcohol.
Claims21
A method for washing a device substrate, which comprises removing an acrylic resin ArF resist attached to a device substrate by of washing said device substrate with a solvent, wherein the solvent is a composition comprising at least one fluorinated compound selected from the group consisting of a hydrofluoroether, a hydrofluorocarbon, and a perfluorocarbon, and a fluorinated alcohol.
(canceled)
Dependencies are inferred from the claim text.