Control Method and Apparatus
AssigneeASML Netherlands B.V.
InventorsEverhardus Cornelis Mos, Birgitt Noëlle Cornelia Liduine Hepp, Jasper Thijs Menger
Life of this patent
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AssigneeASML Netherlands B.V.
InventorsEverhardus Cornelis Mos, Birgitt Noëlle Cornelia Liduine Hepp, Jasper Thijs Menger
Estimating the term…
A higher-level controller can correct measured metrology data with residual error values as reported by a lower-level controller. This results in a more accurate process disturbance estimate. A method of control obtains, based on measurement sample definition, a first process variable of a system under control, determines a residual error using the first process variable and a first set point, controls the system using the residual error, obtains, based on the same sample definition, a second process variable, and adjusts the second process variable using the residual error. The method may also include determining, using the adjusted second process variable, one or more first set points for controlling the system by the low-level controller that may vary in correspondence with the sample definition.
A method, comprising:
A control apparatus, comprising:
A lithographic apparatus, comprising:
An article of manufacture including a computer-readable medium having instructions stored thereon, execution of which by a computing device causes the computing device to perform operations comprising:
Dependencies are inferred from the claim text.