Back to results
US 2012/0058576 A1Published application
Deposition System
OwnerMarkus E. Beck, Ashish Bodke +5inventors
InventorsMarkus E. Beck, Ashish Bodke, Yacov Elgar, Dhruv Gajaria, Raffi Garabedian, Jing Guo, Erel Milshtein
Life of this patent
Estimating the term…
Abstract
A pumping and valve control device can be used in an atomic layer deposition system.
Claims31
A deposition system comprising:
- an inlet valve for introducing a processing gas into a reaction chamber, the inlet valve having a short reaction time;
- a reaction chamber adjacent to the inlet valve having a deposition temperature and deposition pressure and configured to form a layer of material on a substrate by atomic vapor deposition;
- a pump adjacent to the reaction chamber, wherein the pump have an adjustable pumping speed to control the pressure in the reaction chamber and evacuation speed of the reaction chamber;
- an outlet regulation valve adjacent to the reaction chamber, the outlet regulation valve having a short reaction time and being synchronized with the inlet valve;
- and
- a control module for dynamic control of the adjustable pumping speed of the pump and synchronization between the inlet valve and regulation valve to achieve high utilization rate and flow uniformity of the processing gas.
3 more elements
A method of atomic layer deposition comprising:
- pulsing a first precursor gas into a reaction chamber through an inlet valve to form a first monolayer on a surface of a substrate in the reaction chamber;
- evacuating the first precursor gas from the reaction chamber through an outlet regulation valve;
- pulsing a second precursor gas into the reaction chamber through the inlet valve, wherein the second precursor gas reacts with the first monolayer on the surface to form a second monolayer on the surface of the substrate and at least one purgable material in the reaction chamber;
- and
- purging the purgable material from the reaction chamber through the outlet regulation valve, wherein the inlet valve and outlet regulation valve have short reaction time and are synchronized.
2 more elements
Dependencies are inferred from the claim text.