US 2012/0057613 A1 · LASER ANNEALING METHOD AND LASER ANNEALING DEVICE

Abstract

The energy distribution in the short-side direction of a rectangular laser beam applied to an amorphous semiconductor film (amorphous silicon film) is uniformized. It is possible to the energy distribution in the short-side direction of the rectangular laser beam by the use of a cylindrical lens array 26 or a light guide 36 and concentrating optical systems 28 and 44 or by the use of an optical system including a diffracting optical element. Accordingly, since the effective energy range of a laser beam applied to the amorphous semiconductor film is widened and the transport speed of a substrate 3 can be enhanced as much, it is possible to improve the processing ability of the laser annealing.

Claims15

Dependent claims

A laser irradiation device comprising:

a first cylindrical lens;
a second cylindrical lens;
a optical system interposed between the first cylindrical lens and the second cylindrical lens, the optical system including a first glass plate and a second glass plate,
wherein a first length of the first glass plate is different from a second length of the second glass plate.

1 more element

Dependencies are inferred from the claim text.

Facts

Application

13/222,427Filed 31 Aug 2011

Priority

JP 2006-00586413 Jan 2006

Published

8 Mar 2012

Term ends

Not estimatedThe source records don’t support an estimate.

Classification12 codes

B23K 26/0738
Shaping the laser spot: into a linear shape
B23K 26/0608
By a combination of beams: in the same heat affected zone [HAZ]
B23K 26/067
Shaping the laser beam, e.g. by masks or multi-focusing: dividing the beam into multiple beams, e.g. multi-focusing
B23K 26/0732
Shaping the laser spot: into a rectangular shape

Laser annealing method and laser annealing device

Life of this patent

Laser annealing method and laser annealing device

Life of this patent

Abstract

Claims15