Original and article manufacturing method using same
AssigneeCanon Kabushiki Kaisha
InventorsHirotoshi TORII, Yusuke TANAKA
Life of this patent
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Abstract
The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.
Claims13
An original having a pattern to be transferred, wherein the original has a negative effective Poisson's ratio.
A light-transmissive original having a pattern to be transferred, wherein the original has an effective Poisson's ratio smaller than that of a quartz glass plate.
A method of manufacturing an article, the method comprising:
- transferring a pattern to an object using an original caused to be deformed in accordance with a target shape;
- and
- processing the object, on which the pattern has been transferred, to manufacture the article,
- wherein the original has a negative effective Poisson's ratio.
A method of manufacturing an article, the method comprising:
- transferring a pattern to an object using an original caused to be deformed in accordance with a target shape;
- and
- processing the object, on which the pattern has been transferred, to manufacture the article,
- wherein the original has an effective Poisson's ratio smaller than that of a quartz glass plate.
Dependencies are inferred from the claim text.