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US 2011/0300473 A1Published application
Method for nanopatterning using nanomasks and light exposure
AssigneeLightware Power, Inc.
InventorJin Ji
Life of this patent
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Abstract
A nanomask for generating an illumination pattern includes a layer having a first surface and a second surface and a plurality of resonant nano-features disposed on at least a selected one of the first surface and the second surface. The nanomask is configured to provide an illumination pattern adjacent to the second surface. The illumination pattern has dimensions smaller than a wavelength λ of electromagnetic radiation used to illuminate the first surface of the layer in a single illumination. A nanopatterning method is also described.
Claims16
A nanomask for generating an illumination pattern, comprising:
- a layer having a first surface and a second surface and a plurality of resonant nano-features disposed on at least a selected one of said first surface and said second surface, said nanomask configured to provide an illumination pattern adjacent to said second surface, said illumination pattern having dimensions smaller than a wavelength λ of electromagnetic radiation used to illuminate said first surface of said layer in a single illumination.
Dependencies are inferred from the claim text.