Method for Film Formation, Apparatus for Film Formation, and Computer-Readable Recording Medium
AssigneeTokyo Electron Limited
InventorsMasamichi Hara, Yasushi Mizusawa, Satoshi Taga, Atsushi Gomi, Tatsuo Hatano
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Abstract
Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.
Claims6
A method for forming a metal film on the surface of a substrate to be processed by comprising:
- flowing a process gas including a raw gas containing a metal carbonyl and a carrier gas containing carbon monoxide to a region of an upper-outer side of a diameter direction than the periphery of the substrate to be processed;
- and
- diffusing the metal carbonyl to the surface of the substrate to be processed from the flow of the process gas thereby depositing the metal film on the surface of the substrate to be processed.
6-16. (canceled)
Dependencies are inferred from the claim text.