Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method
AssigneeASML Netherlands B.V.
InventorsLaurentius Johannes Adrianus Van Bokhoven, Nicolaas Ten Kate, Pieter Jacob Kramer
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Abstract
A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
Claims16
A fluid supply system for a lithographic apparatus, comprising:
- a first fluid flow path for fluid between a fluid source and a first component;
- a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component;
- and
- a first controller configured to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
A lithographic apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate;
- and
- a fluid supply system, comprising:
- a first fluid flow path for fluid between a fluid source and a first component;
- a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component;
- and
- a first controller configured to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
A method of varying the fluid flow rate to a component from a fluid source, the method comprising varying the fluid flow in a drain fluid flow path between a drain component and a junction in a first fluid flow path between the fluid source and the component.
Dependencies are inferred from the claim text.