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US 2011/0298465 A1Published application
Process monitor and semiconductor manufacturing apparatus
AssigneeTokyo Electron Limited
InventorMitsuhiro YUASA
Life of this patent
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Abstract
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.
Claims1
A process monitoring apparatus for monitoring a semiconductor manufacturing process, comprising:
- a container element;
- a monitor element including a wafer and a plurality of sensors attached to the wafer, the monitor element being able to be transferred into target environments in a process facility or into the container element by a transfer robot;
- and
- an electronics module attached to the container element, the electronics module being available for communication with the monitor element when the monitor element is transferred into the container element.
1 more element
Dependencies are inferred from the claim text.