Semiconductor devices with through-silicon vias

Abstract

Through silicon vias (TSVs) include a first metal plug having a cylindrical shape, passing through a semiconductor substrate, and with an outer peripheral surface surrounded by a first insulating film; an isolated semiconductor substrate in the semiconductor substrate and surrounding a first metal plug surrounded by a first insulating film; and a second metal plug surrounding the isolated semiconductor substrate and being surrounded by a second insulating film. A first bias voltage is applied to the isolated semiconductor substrate so that a depletion layer is formed in the isolated semiconductor substrate from an interface between the isolated semiconductor substrate and the first insulating film. The first bias voltage is different from a second bias voltage applied to the semiconductor substrate, which is a main semiconductor substrate, with a device forming area where transistors constituting circuits are formed.

Dependencies are inferred from the claim text.