Transparent substrate for photonic devices

Abstract

Transparent substrate (1) for photonic devices comprising a support (10) and an electrode (11), said electrode (11) comprising a lamination structure comprising a single metal conduction layer (112) and at least one coating (110) having properties for improving the light transmission through said electrode, wherein said coating (110) has a geometric thickness at least more than 3.0 nm and at most less than or equal to 200 nm, and said coating (110) comprises at least one layer for improving light transmission (1101) and is located between the metal conduction layer (112) and the support (10), on which said electrode (11) is deposited, said transparent substrate (1) is such in that the optical thickness of the coating having properties for improving the light transmission (110), TD1, and the geometric thickness of the metal conduction layer (112), TME, are linked by the equation: TME=TME—o+[B*sin(π*TD1/TD1—o)]/(nsupport)3 where TMEo, B and TD1—o are constants with TME—o having a value in the range of 10.0 to 25.0 nm, B having a value in the range of 10.0 to 16.5 nm and TD1—o having a value in the range of 23.9*nD1, to 28.3*nD1 nm, with nD1 representing the refractive index of the coating for improving the light transmission at a wavelength of 550 nm and nsupport represents the refractive index of the support at a wavelength of 550 nm.

Dependencies are inferred from the claim text.