Mirror and extreme ultraviolet light generation system
OwnerHidenobu Kameda, Osamu Wakabayashi +1inventors
InventorsHidenobu Kameda, Osamu Wakabayashi, Masato Moriya
Life of this patent
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Abstract
A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
Claims22
A mirror comprising:
- a substrate;
- a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate;
- and
- a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
A mirror comprising:
- a substrate;
- a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate;
- a smoothing layer provided on the thermal diffusion layer;
- and
- a reflective layer provided on the smoothing layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
A mirror comprising:
- a substrate;
- a smoothing layer provided on a principal surface of the substrate;
- a thermal diffusion layer provided on the smoothing layer, the thermal diffusion layer having a higher thermal conductivity than the substrate;
- and
- a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
An extreme ultraviolet light generation system used with a laser apparatus, the extreme ultraviolet light generation system comprising:
- a chamber;
- a target generator provided to the chamber for supplying a target material into the chamber;
- and
- at least one mirror including a substrate, a thermal diffusion layer provided on a principal surface of the substrate, and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
An extreme ultraviolet light generation system used with a laser apparatus, the extreme ultraviolet light generation system comprising:
- a chamber;
- a target generator provided to the chamber for supplying a target material into the chamber;
- and
- at least one mirror including a substrate, a thermal diffusion layer provided on a principal surface of the substrate, a smoothing layer provided on the thermal diffusion layer, and a reflective layer provided on the smoothing layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
An extreme ultraviolet light generation system used with a laser apparatus, the extreme ultraviolet light generation system comprising:
- a chamber;
- a target generator provided to the chamber for supplying a target material into the chamber;
- and
- at least one mirror including a substrate, a smoothing layer provided on a principal surface of the substrate, a thermal diffusion layer provided on the smoothing layer, and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
Dependencies are inferred from the claim text.