Charged particle beam device and method for correcting position with respect to charged particle beam
AssigneeHitachi High-Technologies Corporation
InventorsYuichi Madokoro, Megumi Aizawa, Yukio Yoshizawa
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AssigneeHitachi High-Technologies Corporation
InventorsYuichi Madokoro, Megumi Aizawa, Yukio Yoshizawa
Estimating the term…
An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
A charged particle beam apparatus comprising:
A position correction processing method in a charged particle beam apparatus comprising the steps of:
Dependencies are inferred from the claim text.