Pulsed Plasma to Affect Conformal Processing

A method of introducing ions to a non-planar workpiece surface, comprising:

• generating a plasma having a sheath using a power source;
• disabling said power source after said plasma has been generated so as to eliminate said sheath, thereby creating equipotential field lines which follow the contours of said non-planar workpiece;
• biasing said non-planar workpiece so as to attract ions previously generated in said plasma toward said non-planar workpiece, wherein the path of said ions attracted toward said non-planar workpiece is determined based on said equipotential field lines.

A method of conformal processing of a workpiece comprising:

• creating a non-planar feature on a surface of said workpiece;
• creating an ion-ion plasma;
• biasing said workpiece to attract ions from said ion-ion plasma toward said non-planar feature on said surface, wherein said ions strike said workpiece at a plurality of incident angles.