Multiple precursor concentric delivery showerhead
AssigneeApplied Materials, Inc.
InventorsAlexander Tam, Anzhong Chang, Sumedh Acharya
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AssigneeApplied Materials, Inc.
InventorsAlexander Tam, Anzhong Chang, Sumedh Acharya
Estimating the term…
A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. In one embodiment, the apparatus provides a processing chamber that includes a showerhead with separate inlets and channels for delivering separate processing gases into a processing volume of the chamber without mixing the gases prior to entering the processing volume. In one embodiment, a plurality of concentric tube assemblies are disposed within the showerhead to separately deliver a first gas from a first gas channel and a second gas from a second gas channel into the processing volume of the chamber. In one embodiment, the showerhead further includes a heat exchanging channel through which the plurality of concentric tube assemblies is disposed.
A showerhead apparatus, comprising:
A substrate processing apparatus, comprising:
A method of processing substrates, comprising:
Dependencies are inferred from the claim text.