Method for manufacturing solar cell, etching device, and cvd device
AssigneeUlvac, Inc.
InventorsHirohisa Takahashi, Satoru Ishibashi, Sadayuki Ukishima, Masahide Matsubara, Satoshi Okabe
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AssigneeUlvac, Inc.
InventorsHirohisa Takahashi, Satoru Ishibashi, Sadayuki Ukishima, Masahide Matsubara, Satoshi Okabe
Estimating the term…
A solar cell manufacturing method according to the present invention is a solar cell manufacturing method that forms a transparent conductive film of ZnO as an electric power extracting electrode on a light incident side, the method comprises at least in a following order: a process A forming the transparent conductive film on a substrate by applying a sputtering voltage to sputter a target made of a film formation material for the transparent conductive film; a process B forming a texture on a surface of the transparent conductive film; a process C cleaning the surface of the transparent conductive film on which the texture has been formed using an UV/ozone; and a process D forming an electric power generation layer on the transparent conductive film.
A solar cell manufacturing method that forms a transparent conductive film of ZnO as an electric power extracting electrode on a light incident side, the method comprising, at least in a following order:
6-8. (canceled)
A CVD device that forms an electric power generation layer for a solar cell by a CVD method, comprising:
Dependencies are inferred from the claim text.