Method for detaching layers with low magnetic permeability
AssigneeAdvanced Optoelectronic Technology, Inc.
InventorSHIH-CHENG HUANG
Life of this patent
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Abstract
A method for detaching a first material layer from a second material layer includes following steps: forming a high-magnetic-permeability material layer on a first material layer comprised of low-magnetic-permeability material; removing a portion of the high-magnetic-permeability material layer to expose a portion of the first material layer; epitaxially growing a second material layer comprised of low-magnetic-permeability material on the exposed portion of the first material layer and the high-magnetic-permeability material layer; cooling the first and second material layers; heating the high-magnetic-permeability material layer, thus detaching the first material layer from the second material layer.
Claims11
A method for detaching a first material layer from a second material layer, comprising:
- forming a high-magnetic-permeability material layer on the first material layer;
- removing a portion of the high-magnetic-permeability material layer to expose a portion of the first material layer;
- epitaxially growing the second material layer on the exposed portion of the first material layer, the second material layer covering the high-magnetic-permeability material layer, wherein the first and second material layers are comprised of low-magnetic-permeability materials;
- cooling the first and second material layers such that the first and second material layers shrink;
- and
- heating the high-magnetic-permeability material layer using a high-frequency radiofrequency electromagnetic wave such that the high-magnetic-permeability material layer expands, thus detaching the first material layer from the second material layer.
Dependencies are inferred from the claim text.