Mask blank substrate set and mask blank set
AssigneeHoya Corporation
InventorMasaru Tanabe
Life of this patent
Estimating the term…
Abstract
A substrate set is a mask blank substrate set including a plurality of substrates each for use in a mask blank for producing a photomask to be chucked on a mask stage of an exposure apparatus. In each of the substrates in the mask blank substrate set, a main surface, on the side where a thin film for forming a transfer pattern is to be formed, has a convex shape being relatively high at its center and relatively low at its peripheral portion. In each substrate, the flatness in a 142 mm square area, including a central portion, of the main surface is 0.3 μm or less and the difference upon fitting to a reference main surface of a reference substrate is 40 nm or less.
Claims24
A mask blank substrate set comprising:
- a plurality of substrates each for use in a mask blank for producing a photomask to be chucked on a mask stage of an exposure apparatus;
- wherein, in each of the substrates in the mask blank substrate set, a main surface, on a side where a thin film for forming a transfer pattern is to be formed, has a convex shape being relatively high at its center and relatively low at its peripheral portion, and a difference upon performing fitting in a 132 mm square area, including the central portion, of the main surface with respect to a reference main surface of a reference substrate is 40 nm or less.
A mask blank set comprising:
- a plurality of mask blanks each for producing a photomask to be chucked on a mask stage of an exposure apparatus;
- wherein each of the mask blanks in the mask blank set has a structure in which a thin film for forming a transfer pattern is formed on a main surface of a substrate, and
- wherein, in the substrate of each of the mask blanks in the mask blank set, the main surface has a convex shape being relatively high at its center and relatively low at its peripheral portion, and a difference upon performing fitting in a 132 mm square area, including the central portion, of the main surface with respect to a reference main surface of a reference substrate is 40 nm or less.
A photomask set comprising:
- a plurality of photomasks each of which is to be chucked on a mask stage of an exposure apparatus;
- wherein each of the photomasks in the photomask set has a structure in which a thin film having a transfer pattern is formed on a main surface of a substrate, and
- wherein, in the substrate of each of the photomasks in the photomask set, the main surface has a convex shape being relatively high at its center and relatively low at its peripheral portion, and a difference upon performing fitting in a 132 mm square area, including the central portion, of the main surface with respect to a reference main surface of a reference substrate is 40 nm or less.
A semiconductor device manufacturing method comprising:
- transferring, using a set of photomasks, transfer patterns of the photomasks in turn onto a semiconductor substrate by photolithography,
- wherein each of the photomasks in the photomask set has a structure in which a thin film having one of the transfer patterns is formed on a main surface of a substrate, and
- wherein, in the substrate of each of the photomasks in the photomask set, the main surface has a convex shape being relatively high at its center and relatively low at its peripheral portion, and a difference upon performing fitting in a 132 mm square area, including the central portion, of the main surface with respect to a reference main surface of a reference substrate is 40 nm or less.
Dependencies are inferred from the claim text.