Aluminum nitride film and a substance coated with same
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji Katoh, Shoji Kano
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji Katoh, Shoji Kano
Estimating the term…
There are provided an aluminum nitride film and a substance, coated with such a film; the film is new in that it has a brightness or lightness L* of 60 or lower; preferably the film has a transmittance of 15% or lower for a visible and near infrared radiation having a wave length of 0.35-2.5 micrometers, the combined concentration of metallic elements as impurities but for Al is 50 ppm or smaller, and the film is heat-treated at a temperature of 1050 degrees centigrade or higher but lower than 1400 degrees centigrade, and the film is a product of CVD method; the substance coated with the film is preferably a ceramic material such as a nitride, an oxide, and a carbide or a metal having a low thermal expansion coefficient such as tungsten, molybdenum and tantalum.
An aluminum nitride film characterized in having a lightness L* of 60 or lower as defined in JIS Z8729.
A method for manufacturing an aluminum nitride film having a lightness L* of 60 or lower as defined in JIS Z8729, a transmittance of 15% or lower for a visible and near infrared radiation having a wave length of 0.35-2.5 micrometers, and metallic impurities but for aluminum in an amount of 50 parts per million or smaller, comprising steps of:
Dependencies are inferred from the claim text.