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US 2011/0256313 A1Published application
Delivery device
AssigneeRohm and Haas Electric Materials LLC
InventorDeodatta Vinayak SHENAI-KHATKHATE
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Abstract
Delivery devices for delivering solid precursor compounds in the vapor phase to reactors are provided. Such devices include a precursor composition of a solid precursor compound with a layer of packing material disposed thereon. Also provided are methods for transporting a carrier gas saturated with the precursor compound for delivery into such CVD reactors.
Claims6
A method of depositing a film comprising the steps of:
- a) providing the vapor phase delivery device comprising a chamber containing a precursor composition;
- a gas inlet;
- a gas outlet;
- a fill port;
- and a dip-tube contained within the chamber, the dip tube being connected to and in fluid communication with the gas outlet;
- wherein the precursor composition consists of a solid precursor compound and a single layer of packing material disposed on the solid precursor compound;
- b) introducing a carrier gas into the delivery device through the gas inlet;
- c) flowing the carrier gas through the layer of packing material and then though the solid precursor compound to substantially saturate the carrier gas with the precursor compound;
- d) the precursor compound saturated carrier gas exiting from the delivery device through the gas outlet by way of the dip-tube;
- e) delivering the precursor compound saturated carrier gas to a reaction vessel containing a substrate;
- and f) subjecting the precursor compound saturated carrier gas to conditions sufficient to decompose the precursor compound to form a film on the substrate.
8 more elements
Dependencies are inferred from the claim text.