US 2011/0255064 A1 · PHOTOLITHOGRAPHY METHOD AND DEVICE

Abstract

A photolithography method includes projecting a light beam through a mask onto a photosensitive layer to form on the photosensitive layer an image of a mask pattern formed by the mask, and controlling a layer of active elements of the mask so that the light beam after having traversed the layer of active elements, reproduces the mask pattern onto the photosensitive layer. The active elements are distributed throughout the layer of active elements in conformance with a matrical organization of lines and columns, each active element being individually controllable to take a state transparent to the light of the light beam, or else a state opaque to or reflecting of the light of the light beam, as a function of a command signal supplied to the active element.

Claims25

Dependent claims

A photolithography method for manufacturing circuits, the method comprising:

projecting a light beam through a mask onto a photosensitive layer deposited on a substrate to form on the photosensitive layer an image of a mask pattern formed by the mask;
controlling a layer of active elements of the mask, so that the light beam, after having traversed the layer of active elements, reproduces the mask pattern onto the photosensitive layer, the active elements being distributed throughout the layer in conformance with a matrical organization of lines and of columns transversal to the lines, each active element being individually controlled to take a state transparent to the light of the light beam, or else a state that is not transparent to the light of the light beam, as a function of a command signal supplied to the active element, the mask pattern reproduced by the layer defining an identifying mark that uniquely identifies each of a plurality of circuits formed on the substrate.

Dependencies are inferred from the claim text.

Photolithography method and device

Life of this patent

Photolithography method and device

Life of this patent

Abstract

Claims25