Mems device having a movable electrode
AssigneeSeiko Epson Corporation
InventorsToru WATANABE, Akira SATO, Shogo INABA, Takeshi MORI
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Abstract
A microelectromechanical system (MEMS) device includes a semiconductor substrate, a MEMS including a fixed electrode and a movable electrode formed on the semiconductor substrate through an insulating layer, and a well formed in the semiconductor substrate below the fixed electrode. The well is one of an n-type well and a p-type well. The p-type well applies a positive voltage to the fixed electrode while the n-type well applies a negative voltage to the fixed electrode.
Claims8
A microelectromechanical system (MEMS) device, comprising:
- a semiconductor substrate;
- a p-type well formed on the semiconductor substrate;
- an insulating layer formed on the p-type well;
- and
- a MEMS including a first fixed electrode supporting a movable electrode and a second fixed electrode formed in an opposite direction to the movable electrode,
- wherein the first fixed electrode and the second fixed electrode are formed on the insulating layer on the upper side of the p-type well,
- wherein a positive voltage is applied to at least one of the first fixed electrode and the second fixed electrode.
A microelectromechanical system (MEMS) device, comprising:
- a semiconductor substrate;
- a n-type well formed on the semiconductor substrate;
- an insulating layer formed on the n-type well;
- and
- a MEMS including a first fixed electrode supporting a movable electrode and a second fixed electrode formed in an opposite direction to the movable electrode,
- wherein the first fixed electrode and the second fixed electrode are formed on the insulating layer on the upper side of the n-type well,
- wherein an negative voltage is applied to at least one of the first fixed electrode and the second fixed electrode.
Dependencies are inferred from the claim text.