Back to results
US 2011/0253900 A1Published application
Lithography system, sensor, converter element and method of manufacture
AssigneeMapper Lithography IP B.V.
InventorRabah HANFOUG
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
AssigneeMapper Lithography IP B.V.
InventorRabah HANFOUG
Estimating the term…
Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets. The sensor comprises a converter element for receiving charged particles and generating photons in response. The converter element comprises a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets. Each cell comprises a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface. The converter element surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light. An electrically conductive layer is located between the coating layer and the blocking structures.
Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets, the sensor comprising a converter element for receiving charged particles and generating photons in response, the converter element comprising a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets, each cell comprising a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface, wherein the converter element surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light, and an electrically conductive layer is located between the coating layer and the blocking structures.
Sensor for generating a signal in response to exposure thereof by a charged particle beam, the sensor comprising a converter element for receiving charged particles and generating photons in response, the converter element comprising a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets, each cell comprising a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface, wherein said converter surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light, and an electrically conductive layer is located between the coating layer and the blocking structures, and wherein the sensor further comprises a photon receptor associated with the converter element for generating a signal on the basis of photons generated by the converter element.
Converter element for receiving charged particles and generating photons in response for use in a sensor for sensing a characteristic of a plurality of charged particles beamlets, the converter element comprising a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets, each cell comprising a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface, wherein the converter element surface is covered with a coating layer substantially permeable for charged particles and substantially impermeable for ambient light, and an electrically conductive layer is located between the coating layer and the blocking structures.
Method of manufacturing a converter element arranged for selectively converting impinging charged particles into photons, the method comprising:
Dependencies are inferred from the claim text.