Method and apparatus for washing substrate
OwnerKazuhide SAITOinventor
Life of this patent
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Abstract
A substrate washing method for supplying a process liquid onto a substrate to wash the substrate includes the steps of (a) supplying a first process liquid of a first temperature onto the substrate having a resist pattern, to cover a surface of the substrate with the first process liquid, and (b) supplying a second process liquid onto the surface of the substrate covered with the first process liquid, to cover the surface of the substrate with the second process liquid of a second temperature higher than the first temperature, thereby removing the resist pattern.
Claims17
A substrate washing method comprising the steps of:
- (a) supplying a first process liquid of a first temperature onto a substrate having a resist pattern, to cover a surface of the substrate with the first process liquid;
- and
- (b) supplying a second process liquid onto the surface of the substrate covered with the first process liquid, to cover the surface of the substrate with the second process liquid of a second temperature higher than the first temperature, thereby removing the resist pattern.
A substrate washing apparatus comprising:
- a substrate holder configured to hold a substrate;
- a chemical liquid mixer configured to mix a first chemical liquid and a second chemical liquid to obtain a third chemical liquid;
- a pouring nozzle configured to pour the third chemical liquid onto the substrate;
- a chemical liquid pipe configured to allow the third chemical liquid to flow from the chemical liquid mixer to the pouring nozzle;
- and
- a cooling liquid-filled pipe configured to cover the chemical liquid pipe.
A substrate washing apparatus comprising:
- a substrate holder configured to hold a substrate;
- a chemical liquid mixer configured to mix a first chemical liquid and a second chemical liquid to obtain a third chemical liquid;
- a chemical liquid temperature adjuster configured to adjust the temperature of the third chemical liquid;
- and
- a pouring nozzle configured to pour the third chemical liquid onto the substrate.
A substrate washing apparatus comprising:
- a substrate holder configured to hold a substrate;
- a chemical liquid mixer configured to mix a first chemical liquid and a second chemical liquid to obtain a third chemical liquid;
- a pouring nozzle configured to pour the third chemical liquid onto the substrate;
- and
- a substrate temperature adjuster configured to adjust the temperature of the substrate.
Dependencies are inferred from the claim text.