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US 2011/0253174 A1Published application
Method for decontaminating semiconductor wafers
AssigneeSTMicroelectronics (Rousset) SAS
InventorsChristophe Martin, Sëbastien Collura
Life of this patent
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Abstract
A method for decontaminating at least one object contained in a chamber, the method including a succession of alternated steps of lowering and increasing the pressure in the chamber.
Claims9
A method for decontaminating at least one object contained in a chamber, the method comprising a succession of alternated steps of lowering and increasing the pressure in the chamber, wherein, in pressure increasing steps, a gas previously heated to a temperature greater than the ambient temperature is injected into the chamber.
Dependencies are inferred from the claim text.