Intelligent pattern signature based on lithography effects
AssigneeCadence Design Systems, Inc.
InventorsJunjiang Lei, Kuang-Hao Lay, Srini Doddi, Weiping Fang
Life of this patent
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Abstract
The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
Claims12
1-14. (canceled)
A computer implemented method of storing pattern information in a database comprising:
- using at least one processor that is configured or programmed for performing a process, the process comprising:
- receiving a request to check whether information of a new pattern needs storing in a database, wherein the new pattern is represented by a pattern signature derived according to lithography effects to the new pattern;
- comparing the pattern signature representing the new pattern with pattern signatures representing patterns of which the information is already stored in the database;
- storing the information of the new pattern in the database if none of the pattern signatures representing patterns of which the information is already stored in the database matches the pattern signature representing the new pattern;
- associating the pattern signature representing the new pattern with the information of the new pattern stored in the database;
- and
- flagging the new pattern if one of the pattern signatures representing patterns of which the information is already stored in the database matches the pattern signature representing the new pattern.
A method of using pattern signatures to facilitate analyzing information of a pattern, comprising:
- using at least one processor that is configured or programmed for performing a process, the process comprising:
- receiving a request for analyzing information of a new pattern wherein the new pattern is represented by a pattern signature derived according to lithography effects to the new pattern;
- comparing the pattern signature representing the new pattern with pattern signatures representing patterns of which the information is already known;
- generating the information of the new pattern if none of the pattern signatures representing patterns of which the information is already known matches the pattern signature representing the new pattern, and analyzing the information of the new pattern;
- and
- analyzing the known information of a pattern if the pattern signature representing the pattern matches the pattern signature representing the new pattern.
(canceled)
A system for storing pattern information in a database, comprising:
- at least one processor for performing one or more actions, the one or more actions comprising:
- receiving a request to check whether information of a new pattern needs storing in a database, wherein the new pattern is represented by a pattern signature derived according to lithography effects to the new pattern;
- comparing the pattern signature representing the new pattern with pattern signatures representing patterns of which the information is already stored in the database;
- storing the information of the new pattern in the database if none of the pattern signatures representing patterns of which the information is already stored in the database matches the pattern signature representing the new pattern;
- associating the pattern signature representing the new pattern with the information of the new pattern stored in the database;
- and
- flagging the new pattern if one of the pattern signatures representing patterns of which the information is already stored in the database matches the pattern signature representing the new pattern.
A system for using pattern signatures to facilitate analyzing information of a pattern, comprising:
- at least one processor for performing one or more actions, the one or more actions comprising:
- receiving a request for analyzing information of a new pattern, wherein the new pattern is represented by a pattern signature derived according to lithography effects to the new pattern;
- comparing the pattern signature representing the new pattern with pattern signatures representing patterns of which the information is already known;
- generating the information of the new pattern if none of the pattern signatures representing patterns of which the information is already known matches the pattern signature representing the new pattern, and analyzing the information of the new pattern;
- and
- analyzing the known information of a pattern if the pattern signature representing the pattern matches the pattern signature representing the new pattern.
Dependencies are inferred from the claim text.