Pellicle for lithography
AssigneeShin-Etsu Chemical Co., Ltd.
InventorToru Shirasaki
Life of this patent
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Abstract
There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by virtue of a unique structure of the mask-boding agglutinant layer, that is, the agglutinant layer is formed of two or more juxtaposed endless belts of which the inner-most belt that faces the pellicle hollow is made of a substance which is non-agglutinant while at least one of the other belts is agglutinant; when the outer-most belt is also made of a non-agglutinant substance, the outgas is completely prevented from escapting from the pellicle.
Claims4
A pellicle for lithography comprising a pellicle frame and a pellicle membrane bonded on one of two frame faces of said pellicle frame and an agglutinant layer provided on another one of the two frame faces of said pellicle frame for bonding the pellicle onto a mask, wherein said agglutinant layer consists of at least two sections, one of said at least two sections being an inner-most section made of a non-agglutinant material which faces a hollow of the pellicle, and at least one of the other sections being made of an agglutinant material.
Dependencies are inferred from the claim text.