Back to results
US 2011/0236806 A1Published application
Dc voltage charging of cathode for plasma striking
AssigneeApplied Materials, Inc.
InventorsALAN HIROSHI OUYE, DARIN BIVENS, DAVID KNICK
Life of this patent
Estimating the term…
Abstract
Methods for processing photomasks are provided herein. In some embodiments, a method for processing a photomask may include providing a photomask to a substrate support within a process chamber; providing a process gas to the process chamber having the photomask disposed therein; providing a negative or zero voltage to a substrate support cathode having the photomask disposed thereon; providing a source RF power to an anode coupled to the process chamber to ignite the process gas to form a plasma; and processing the photomask.
Claims20
A method of processing a photomask, comprising:
- providing a photomask to a substrate support within a process chamber;
- providing a process gas to the process chamber having the photomask disposed therein;
- providing a negative or zero voltage to a substrate support cathode having the photomask disposed thereon;
- providing a source RF power to an anode coupled to the process chamber to ignite the process gas to form a plasma;
- and
- processing the photomask.
3 more elements
Dependencies are inferred from the claim text.