Method of patterning metal alloy material layer having hafnium and molybdenum
AssigneeNanya Technology Corporation
InventorsChih-Wei Huang, Chao-Sung Lai, Hsing-Kan Peng, Chung-Yuan Lee, Shian-Jyh Lin
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Abstract
A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.
Claims14
A method of patterning a metal alloy material layer having hafnium and molybdenum, comprising:
- providing a substrate, a metal alloy material layer having hafnium and molybdenum already formed on the substrate;
- forming a patterned mask layer on the metal alloy material layer having hafnium and molybdenum;
- etching the metal alloy material layer having hafnium and molybdenum using the patterned mask layer as a mask with an etchant to form a metal alloy layer having hafnium and molybdenum, wherein the etchant comprises at least nitric acid, hydrofluoric acid and sulfuric acid;
- and
- removing the patterned mask layer.
Dependencies are inferred from the claim text.