Gallium electroplating methods and electrolytes employing mixed solvents
OwnerJiaxiong Wang, Serdar Aksu +1inventors
InventorsJiaxiong Wang, Serdar Aksu, Bulent M. Basol
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Abstract
An electrochemical deposition method and electrolyte to plate uniform, defect free and smooth gallium films are provided. In a preferred embodiment, the electrolyte may include a solvent that comprises water and at least one monohydroxyl alcohol, a gallium salt, and an acid to control the solution pH and conductivity. The method electrodeposits a gallium film possessing sub-micron thickness on a conductive surface. Such gallium layers are used in fabrication of semiconductor and electronic devices such as thin film solar cells.
Claims20
An electrodeposition solution for electrodepositing a gallium (Ga) thin film on a conductive surface, comprising:
- water;
- at least one organic solvent with a room temperature viscosity of less than or equal to 10 centipoise and a freezing point of lower than −20° C.;
- and
- a Ga source material that provides Ga ions.
A method of electrodepositing gallium (Ga) for manufacturing solar cell absorbers, comprising the steps of:
- providing an electrodeposition solution that comprises water, an organic solvent with a room temperature viscosity of less than or equal to 10 centipoise and a freezing point of lower than −20° C., and a Ga source material that provides Ga ions;
- contacting the electrodeposition solution with an electrode and a conductive layer;
- establishing a potential difference between the electrode and the conductive layer;
- and
- electrodepositing a Ga layer over the conductive layer.
Dependencies are inferred from the claim text.