Reduced lens heating methods, apparatus, and systems
AssigneeMicron Technology, Inc.
InventorsFei Wang, Xinya Lei
Life of this patent
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Abstract
In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque area and at least one opening within the opaque area includes a slanted, sub-resolution feature that redistributes a portion of the light passing through the open area to an off-axis location. A method of forming a device by way of photolithography might include forming unresolvable features on a mask and projecting light through the mask. Other systems, methods, and apparatus are disclosed.
Claims15
A method comprising:
- forming a first area of a mask, wherein the first area is formed such that the first area is resolvable by a light;
- and
- forming a second area of the mask, wherein the second area is formed such that the second area is unresolvable by the light and includes slanted lines and spaces within the second area, and the lines are non-intersecting each other and none of portions of the first area is between two of the spaces.
A method comprising:
- depositing an at least partly opaque layer of material on a transparent substrate;
- removing portions of the opaque layer using a first light source having a wavelength to form a pattern including at least one open area having a pattern of lines and spaces within the open area, the pattern of lines and spaces being unresolvable by a second light source;
- and
- projecting light from the second light source through the pattern to replicate the pattern on a target, at least a portion of the light from the second light source being redirected by the unresolvable pattern, the second light source having a wavelength longer than the wavelength of the first light source.
A method comprising:
- depositing an at least partly opaque layer on a glass plate;
- and
- patterning the at least partly opaque layer with a light source having a first wavelength to provide a pattern including a feature in at least one open area, the pattern allowing a first portion of light to pass and distributes a second portion of light to an off axis location.
Dependencies are inferred from the claim text.