Apparatus and methods for chemical vapor deposition
AssigneeApplied Materials, Inc.
InventorsDavid K. Carlson, Errol Antonio C. Sanchez, Satheesh Kuppurao
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Abstract
Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for example for forming films on substrates. The methods and apparatus involve providing a vessel for containing a liquid precursor and diffusing element having external cross-section dimensions substantially equal to the internal cross-sectional dimensions of the vessel.
Claims20
A chemical vapor deposition method comprising:
- flowing a carrier gas through a liquid reactant contained in a vessel defined by walls and a bottom surface, the vessel including a porous sintered metal frit extending between the walls of the vessel and defining a plenum in a bottom portion of the vessel, the porous sintered metal frit submerged in the liquid reactant, causing the carrier gas and the liquid reactant to flow through the porous sintered metal frit to create a vapor from the liquid reactant;
- and
- transporting the vapor to a chamber under conditions such that the liquid reactant forms a layer on a substrate contained within the chamber.
A method of processing a substrate, the method comprising:
- flowing a carrier gas through an inlet conduit to a liquid reactant containing vessel;
- flowing the carrier gas and liquid reactant through a porous sintered metal frit creating a vapor from the liquid reactant;
- and
- flowing the vapor through an outlet conduit.
A deposition method comprising:
- flowing a carrier gas into a liquid reactant containing vessel having walls and a bottom surface;
- flowing the carrier gas and liquid reactant through a porous sintered metal frit extending between the walls of the vessel and defining a plenum in a bottom portion of the vessel, causing the carrier gas and the liquid reactant to flow through the porous sintered metal frit to create a vapor comprising the liquid reactant;
- and
- transporting the vapor to a chamber under conditions such that the liquid reactant forms a layer on a substrate contained within the chamber.
Dependencies are inferred from the claim text.