Method and apparatus for washing substrates

Abstract

An apparatus for washing a substrate includes a scrub washing unit for washing both surfaces of a substrate, which are scrubbed by a rotating brush while supplying pure water to both surfaces of the substrate, a rinse unit for washing the surfaces of the substrate which have been washed by the scrub washing unit using the pure water, and a dry unit for drying the surfaces of the substrate which have been washed by the rinse unit. The scrub washing unit includes an ultrasonic application unit for applying ultrasonic waves to pure water supplied to the both surfaces of the substrate, which are scrubbed by the rotating brush while supplying the pure water to which the ultrasonic wave has been applied by the ultrasonic application unit to the both surfaces of the substrate.

Dependencies are inferred from the claim text.