Physical vapor deposition with insulated clamp
OwnerYouming Li, Jeffrey Birkmeyerinventors
Life of this patent
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Abstract
A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, the cathode configured to include a sputtering target, a radio frequency power supply configured to apply power to the cathode, an anode inside and electrically connected to the side walls of the vacuum chamber, a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate, a clamp configured to hold the substrate to the chuck, wherein the clamp is electrically conductive, and an insulator configured to electrically isolate the substrate from the clamp.
Claims18
A physical vapor deposition apparatus comprising:
- a vacuum chamber having side walls;
- a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target;
- a radio frequency power supply configured to apply power to the cathode;
- an anode inside and electrically connected to the side walls of the vacuum chamber;
- a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate;
- a clamp configured to hold the substrate to the chuck, wherein the clamp is electrically conductive;
- and
- an insulator configured to electrically isolate the substrate from the clamp.
A method of physical vapor deposition comprising:
- applying a radio frequency signal to a cathode in a physical vapor deposition apparatus, wherein the physical vapor deposition apparatus includes:
- a vacuum chamber having side walls;
- the cathode, the cathode inside the vacuum chamber and including a sputtering target;
- an anode inside and electrically connected to the side walls of the vacuum chamber;
- a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck supporting a substrate;
- a clamp holding the substrate to the chuck, wherein the clamp is electrically conductive;
- and
- an insulator configured to electrically isolate the substrate from the clamp;
- and
- depositing material from the sputtering target onto the substrate such that film having a substantially pure (111) crystalline structure is formed.
Dependencies are inferred from the claim text.