Method and apparatus for cleaning substrate

A method of cleaning a substrate comprising:

• performing a scrubbing process on a surface to be cleaned of the rotating substrate with a roll-shaped cleaning member while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width;
• and
• during the scrubbing process, reciprocally moving the roll-shaped cleaning member parallel to the surface to be cleaned of the substrate in a range of movement which is set within 16 times the contact width, near a position where the central axis of the roll-shaped cleaning member and the central axis of the substrate cross each other.

An apparatus for cleaning a substrate comprising:

• a roll-shaped cleaning member for performing a scrubbing process on a surface to be cleaned of the rotating substrate while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width;
• and
• a reciprocally moving mechanism for reciprocally moving the roll-shaped cleaning member parallel to the surface to be cleaned of the substrate in a range of movement which is set within 16 times the contact width, near a position where the central axis of the roll-shaped cleaning member and the central axis of the substrate cross each other.

An apparatus for cleaning a substrate comprising:

• a roll-shaped cleaning member for performing a scrubbing process on a surface to be cleaned of the rotating substrate while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width;
• and
• a reciprocally moving mechanism for reciprocally moving the roll-shaped cleaning member between a cleaning position where the central axis of the roll-shaped cleaning member and the central axis of the substrate cross each other and at least one offset cleaning position where the central axis of the roll-shaped cleaning member is spaced from the central axis of the substrate, and controlling the roll-shaped cleaning member to dwell in the cleaning position and the offset cleaning position during respective predetermined times.