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US 2011/0086500 A1Published application
Impurity implantation method and ion implantation apparatus
OwnerKenji Yoneda, Hiroko Kuboinventors
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Abstract
An impurity is implanted by ion implantation into an object to be processed. The ion implantation is performed using an ion beam which is diverged after being temporarily converged.
Claims21
A method for implanting an impurity by ion implantation into an object to be processed, comprising:
- performing the ion implantation using an ion beam which is diverged after being temporarily converged.
An apparatus for implanting an impurity by ion implantation into an object to be processed, comprising:
- a defocusing unit including a converging lens configured to converge an ion beam and a diverging lens configured to diverge and expand the ion beam converged by the converging lens.
Dependencies are inferred from the claim text.