Phase shift masks
AssigneeSamsung Electronics Co., Ltd.
InventorsSe-Gun Moon, Dong-Seok Nam, Hoon Kim
Life of this patent
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Abstract
A phase shift mask having a first region and a second region in a transverse direction includes a transparent layer, a phase shift pattern disposed in the first region, a transmittance control layer pattern disposed in the second region, and a shading layer pattern disposed on the transmittance control layer pattern. The phase shift pattern has a first pattern including a transparent material and a second pattern including metal. The phase shift mask may prevent haze effects through a cleaning process using an alkaline cleaning solution.
Claims22
A phase shift mask having a first region and a second region in a transverse direction of the phase shift mask, comprising:
- a phase shift pattern disposed in the first region, the phase shift pattern having a first pattern including a transparent material and a second pattern including metal;
- a transmittance control layer pattern disposed in the second region;
- and
- a shading layer pattern disposed on the transmittance control layer pattern in the second region.
A phase shift mask comprising:
- a transparent layer;
- a transmittance control layer disposed on the transparent layer, the transmittance control layer including chrome;
- a shading layer disposed on the transmittance control layer;
- and
- a hard mask layer disposed on the shading layer, the hard mask layer including chrome.
-20. (canceled)
A phase shift mask having a first region and a second region surrounding the first region, the phase shift mask comprising:
- a phase shift pattern in the first region and including a first transparent pattern and a second pattern including metal located on the first pattern;
- a transmittance control layer in the second region;
- and
- a shading pattern located on the transmittance control layer in the second region.
-33. (canceled)
Dependencies are inferred from the claim text.