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AssigneeASML Netherlands B.V.
InventorsHugo Augustinus Joseph Cramer, Henricus Johannes Lambertus Megens
Estimating the term…
A system and method determine an approximate structure of an object on a substrate. This may be applied in model based metrology of microscopic structures to assess critical dimension or overlay performance of a lithographic apparatus. A scatterometer is used to determine approximate structure of an object, such as a grating on a stack, on a substrate. The wafer substrate has an upper layer and an underlying layer. The substrate has a first scatterometry target region, including the grating on a stack object. The grating on a stack is made up of the upper and underlying layers. The upper layer is patterned with a periodic grating. The substrate further has a neighboring second scatterometry target region, where the upper layer is absent. The second region has just the unpatterned underlying layers.
A method of determining an approximate structure of an object on a substrate, the substrate comprising an upper layer and an underlying layer, the substrate comprising a first region, the first region comprising the object, the object comprising a patterned portion of the upper layer and a portion of the underlying layer, and the substrate further comprising a second region where the upper layer is absent, the second region comprising a portion of the underlying layer, the method comprising:
An inspection apparatus for determining an approximate structure of an object on a substrate, the substrate comprising an upper layer and an underlying layer, the substrate comprising a first region, the first region comprising the object, the object comprising a patterned portion of the upper layer and a portion of the underlying layer, and the substrate further comprising a second region where the upper layer is absent, the second region comprising a portion of the underlying layer, the inspection apparatus comprising:
An article of manufacture including a computer-readable medium having instructions stored thereon execution of which by a computing device, cause the computing device to perform operations for determining an approximate structure of an object on a substrate, the instructions being adapted to cause one or more processors to perform a method of determining an approximate structure of an object on a substrate, the substrate comprising an upper layer and an underlying layer, the substrate comprising a first region, the first region comprising the object, the object comprising a patterned portion of the upper layer and a portion of the underlying layer, and the substrate further comprising a second region where the upper layer is absent, the second region comprising a portion of the underlying layer, the operations comprising:
A substrate for determining an approximate structure of an object on the substrate, the substrate comprising an upper layer and an underlying layer, the substrate comprising:
Dependencies are inferred from the claim text.