Planarization over topography with molecular glass materials

A process of lithographically patterning a layer comprised of topographical features, comprising:

• casting a planarizing composition onto the patterned layer, the planarizing composition comprising at least one molecular glass and at least one solvent;
• post apply baking the planarizing composition at a temperature greater than a glass transition temperature of the molecular glass;
• selectively etching a portion of the planarizing composition to expose a top surface of the topographical features defined by the patterned layer surface;
• and
• selectively etching the exposed patterned layer with respect to the planarizing composition.

A planarizing composition, comprising:

• a polyhedral oligomeric silsesquioxane selected from the group consisting of formulas (I)-(VI):
• wherein formula (I) is denoted by the formula T8R3, where T represents R3SiO3/2;
• wherein formula (II) is denoted by the formula Q8M8R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein formula (III) is denoted by the formula T10R3, where T represents R3SiO3/2;
• wherein formula (IV) is denoted by the formula Q10M10R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein formula (V) is denoted by the formula T12R3, where T represents R3SiO3/2;
• wherein formula (VI) is denoted by the formula Q12M12R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein R1 and R2 are independently selected from the group consisting of hydrogen, a linear alkyl group having 1-6 carbon atoms, a branched alkyl group having 2-12 carbon atoms, a cycloalkyl group having 3-17 carbon atoms, a fluorinated linear alkyl group having 2-12 carbon atoms, a fluorinated branched alkyl group having 2-12 carbon atoms, a fluorinated cycloalkyl group having 3-17 carbon atoms, a cycloalkyl substituted alkyl group having 4-23 carbon atoms and an alkyl substituted cycloalkyl group having 4-23 carbon atoms;
• wherein R3 is selected from the group consisting of a linear alkyl group having 1-6 carbon atoms, a branched alkyl group having 2-12 carbon atoms, a cycloalkyl group having 3-17 carbon atoms, a fluorinated linear alkyl group having 2-12 carbon atoms, a fluorinated branched alkyl group having 2-12 carbon atoms, a fluorinated cycloalkyl group having 3-17 carbon atoms, a cycloalkyl substituted alkyl group having 4-23 carbon atoms and an alkyl substituted cycloalkyl group having 4-23 carbon atoms, a cycloaliphatic alcohol, a cycloaliphatic acid, a cycloaliphatic ester, a phenol, an aliphatic alcohol, an aliphatic acid, an aliphatic ester, a fluorocarbon alcohol, an amine, an amide, a vinyl ether, and an epoxide;
• and
• at least one solvent.

A planarizing composition, comprising:

• a polyhedral oligomeric silsesquioxane selected from the group consisting of formulas (I)-(VI):
• wherein formula (I) is denoted by the formula T8R3, where T represents R3SiO3/2;
• wherein formula (II) is denoted by the formula Q8M8R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein formula (III) is denoted by the formula T10R3, where T represents R3SiO3/2;
• wherein formula (IV) is denoted by the formula Q10M10R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein formula (V) is denoted by the formula T12R3, where T represents R3SiO3/2;
• wherein formula (VI) is denoted by the formula Q12M12R1,R2,R3 where Q represents SiO4/2 and MR1,R2,R3 represents R1, R2, R3SiO1/2;
• wherein R1 and R2 are independently selected from the group consisting of hydrogen, a linear alkyl group having 1-6 carbon atoms, a branched alkyl group having 2-12 carbon atoms, a cycloalkyl group having 3-17 carbon atoms, a fluorinated linear alkyl group having 2-12 carbon atoms, a fluorinated branched alkyl group having 2-12 carbon atoms, a fluorinated cycloalkyl group having 3-17 carbon atoms, a cycloalkyl substituted alkyl group having 4-23 carbon atoms and an alkyl substituted cycloalkyl group having 4-23 carbon atoms;
• wherein R3 is selected from the group consisting of a linear alkyl group having 1-6 carbon atoms, a branched alkyl group having 2-12 carbon atoms, a cycloalkyl group having 3-17 carbon atoms, a fluorinated linear alkyl group having 2-12 carbon atoms, a fluorinated branched alkyl group having 2-12 carbon atoms, a fluorinated cycloalkyl group having 3-17 carbon atoms, a cycloalkyl substituted alkyl group having 4-23 carbon atoms and an alkyl substituted cycloalkyl group having 4-23 carbon atoms, a cycloaliphatic alcohol, a cycloaliphatic acid, a cycloaliphatic ester, a phenol, an aliphatic alcohol, an aliphatic acid, an aliphatic ester, a fluorocarbon alcohol, an amine, an amide, a vinyl ether, and an epoxide.
• a crosslinking component;
• a thermal acid generator;
• and
• at least one solvent.