Method for in-situ cleaning of deposition systems
OwnerOlga Kryliouk, Jie Su +2inventors
InventorsOlga Kryliouk, Jie Su, Kevin Griffin, Sandeep Nijhawan
Life of this patent
Estimating the term…
Abstract
A method for in-situ cleaning of a deposition system is disclosed. The method includes providing a deposition system with portions of the deposition system deposited with at least a group III element or a compound of a group III element. Halogen containing fluid is introduced into the deposition system. The halogen containing fluid is permitted to react with the group III element to form a halide. The halide in solid state is converted to a gaseous state. The halide in gaseous state is purged out of the deposition system.
Claims17
A method for in-situ cleaning of a deposition system, comprising:
- providing a deposition system with portions of the deposition system deposited with at least a group III element or a compound of a group III element;
- introducing halogen containing fluid into the deposition system;
- permitting the halogen containing fluid to react with the group III element or the compound of the group III element to form a halide;
- converting the halide to a gaseous state;
- and
- purging the halide in gaseous state out of the deposition system.
Dependencies are inferred from the claim text.