Thin film deposition apparatus including deposition blade

The thin film deposition apparatus of clam 26, wherein a width of each of the deposition blades in the first direction is substantially the same as a width of the first non-deposition regions in the first direction.

The thin film deposition apparatus of clam 26, further comprising additional deposition blades which respectively cover the second non-deposition regions while the deposition material is deposited.

The thin film deposition apparatus of clam 25, wherein the gap through which the deposition blade passes is between the substrate and the second nozzle.

The thin film deposition apparatus of clam 29, wherein a thickness of the deposition blade is less than a height of the gap between the substrate and the second nozzle.

The thin film deposition apparatus of clam 25, further comprising a vaccum chamber which houses the deposition source, the first nozzle, the second nozzle, and the at least one deposition blade, wherein the deposition blade is connected to the vacuum chamber.

The thin film deposition apparatus of clam 31, wherein the deposition blade is connected to the vacuum chamber so to be in the gap when the thin film deposition apparatus is moved to a side of the vacuum chamber during a stand-by mode.

The thin film deposition apparatus of clam 25, further comprising a connection member which connects the deposition source, the first nozzle, and the second nozzle.

The thin film deposition apparatus of clam 33, wherein the connection member guides a movement of the discharged deposition material.

The thin film deposition apparatus of clam 33, wherein the connection member seals a space between the deposition source, the first nozzle, and the second nozzle.

The thin film deposition apparatus of clam 25, wherein the second nozzle is separated from the substrate by a predetermined distance.

The thin film deposition apparatus of clam 25, wherein the deposition material discharged through the second nozzle is continuously deposited on the substrate while the substrate is moved relative to the second nozzle in the first direction.

The thin film deposition apparatus of clam 25, wherein the second nozzle is smaller than the substrate.

The thin film deposition apparatus of clam 25, wherein each of the plurality of first slits is tilted at a predetermined angle.

The thin film deposition apparatus of clam 39, wherein the first slits are arranged in two rows formed in the first direction, and the first slits in a first one of the rows are tilted at the predetermined angle towards the first slits in a second of the rows.

The thin film deposition apparatus of clam 39, wherein:

• the first slits comprise first slits arranged in first and second rows formed in the first direction,
• the first slits arranged in the first row located at a first side are arranged to face a second side of the second nozzle, and
• the first slits arranged in the second row located at the second side are arranged to face the first side of the second nozzle.

A thin film deposition assembly for use with a substrate having a non-deposition region between adjacent pairs of deposition regions, the thin film deposition assembly comprising:

• a thin film deposition apparatus comprising a deposition source, a first nozzle assembly, and a second nozzle assembly disposed between the first nozzle assembly and the substrate such that a deposition material from the deposition source passes through the first and second nozzle assemblies and is deposited on the deposition regions;
• and
• a deposition blade disposed such that, due to a relative motion between the thin film deposition apparatus and the substrate, the deposition blade passes relative to the deposition source to block the deposition material such that the deposition material is deposited on the deposition blade.