Exposure apparatus, exposure system, and method of manufacturing semiconductor device
OwnerKazuya FUKUHARA, Masayuki HATANO +1inventors
InventorsKazuya FUKUHARA, Masayuki HATANO, Takuya KONO
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OwnerKazuya FUKUHARA, Masayuki HATANO +1inventors
InventorsKazuya FUKUHARA, Masayuki HATANO, Takuya KONO
Estimating the term…
In one embodiment, an exposure apparatus is configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light. The apparatus includes an information acquisition unit configured to acquire use history information that is information regarding a use history of the mask. The apparatus further includes a condition derivation unit configured to derive a setting value or a change amount of an optical setting condition of the exposure apparatus, based on the acquired use history information and correspondence information that indicates a correspondence between the use history of the mask and the optical setting condition of the exposure apparatus. The apparatus further includes an exposure unit configured to set the optical setting condition of the exposure apparatus to an optical setting condition specified by the derived setting value or change amount, and to expose the wafer under the set optical setting condition.
An exposure apparatus configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light, the apparatus comprising:
An exposure system comprising an exposure apparatus configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light, and an exposure server configured to function as a server for the exposure apparatus, the apparatus comprising:
A method of manufacturing a semiconductor device by using an exposure apparatus configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light, the method comprising:
Dependencies are inferred from the claim text.