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US 2011/0031650 A1Published application
Adjacent Field Alignment
AssigneeMolecular Imprints, Inc.
InventorsIan Matthew McMackin, Wesley Martin
Life of this patent
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Abstract
Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.
Claims20
A method comprising:
- imprinting, with an imprint lithography template, a first portion of polymerizable material positioned within a first field of a substrate;
- separating the template from the first portion of polymerizable material forming a first patterned layer;
- overlapping the template with a portion of the first field and a portion of a second field;
- imprinting, with the template, a second portion of polymerizable material positioned within the second field of the substrate;
- and,
- separating the template from the second portion of polymerizable material forming a second patterned layer.
3 more elements
A method, comprising:
- imprinting a first field using an imprint lithography template to form a first patterned layer having a first residual layer, the imprint lithography template having a first side and a second side, the first side having a plurality of features and at least one substantially planar portion adjacent to the features;
- positioning the imprint lithography template such that features of the first side are in superimposition with a second field and the planar portion is in superimposition with the first patterned layer;
- and,
- imprinting the second field to form a second patterned layer having a second residual layer.
1 more element
A method for forming a patterned layer with an imprint lithography template, comprising:
- positioning the imprint lithography template over polymerizable material deposited on a first field of a substrate;
- reducing the distance between the template and the substrate such that the template contacts the polymerizable material;
- solidifying the polymerizable material;
- separating the template from the polymerizable material forming a first patterned layer;
- positioning the imprint lithography template over the first patterned layer and polymerizable material deposited on a second field of the substrate;
- reducing the distance between the template and the substrate such that the template contacts the polymerizable material positioned on the second field;
- solidifying the polymerizable material;
- separating the template from the polymerizable material forming a second patterned layer.
5 more elements
Dependencies are inferred from the claim text.