Liquid jet and recovery system for immersion lithography
AssigneeNikon Corporation
InventorsW. Thomas Novak, Andrew J. Hazelton, Douglas C. Watson
Life of this patent
Estimating the term…
Abstract
A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
Claims25
A photolithography tool for use in manufacturing semiconductor devices, the tool comprising:
- a wafer stage;
- a lens;
- and
- a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
A liquid immersion photolithography tool comprising:
- an optical member through which a substrate is exposed to an exposure beam;
- and
- a liquid supply assembly having liquid supply ports,
- wherein the liquid flows in a space between the optical member and the substrate along a direction away from the substrate at its edge.
A method for immersion lithography comprising:
- providing a semiconductor wafer;
- and
- introducing liquid between the semiconductor wafer and a lens along a direction away from the semiconductor wafer at its edge.
A method for immersion lithography comprising:
- providing a substrate which is exposed to an exposure beam through an optical member;
- and
- supplying a liquid between the substrate and the optical member,
- wherein the liquid flows along a direction away from the substrate at its edge.
A photolithography tool for use in manufacturing semiconductor devices, the tool comprising a wafer stage, a lens, and a liquid dispensing assembly coupled to the lens and introducing liquid between a surface of a semiconductor wafer disposed on the wafer stage, and the lens, along a direction away from the semiconductor wafer at its edge.
A method for immersion lithography comprising:
- providing a semiconductor wafer and a lens with a liquid dispensing assembly coupled thereto, in a lithography tool;
- a nozzle of the dispensing assembly introducing liquid between the semiconductor wafer and the lens along a flow direction;
- and
- controlling the flow direction by manipulating the liquid dispensing assembly,
- wherein the introducing comprises directing the liquid along the flow direction away from a center of the semiconductor wafer.
A photolithography tool for use in manufacturing semiconductor devices, the tool comprising:
- a wafer stage;
- a lens;
- and
- a liquid dispensing assembly surrounds the lens and introducing liquid between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge, wherein the liquid dispensing assembly includes a nozzle assembly for dispensing the liquid and a drain assembly for withdrawing the liquid from the surface, the nozzle assembly and drain assembly being disposed substantially oppositely about the lens.
A photolithography tool for use in manufacturing semiconductor devices, the tool comprising:
- a wafer stage;
- a lens;
- and
- a liquid dispensing assembly extending circumferentially about the lens, having an annular ring surrounding the lens, and having a plurality of nozzles and a plurality of drains formed as openings in the annular ring.
Dependencies are inferred from the claim text.