Plasma Processing Apparatus and the Upper Electrode Unit
AssigneeTokyo Electron Limited
InventorTetsuji SATO
Life of this patent
Estimating the term…
Abstract
In a plasma processing apparatus that executes plasma processing on a semiconductor wafer placed inside a processing chamber by generating plasma with a processing gas supplied through a gas supply hole at an upper electrode (shower head) disposed inside the processing chamber, an interchangeable insert member is inserted at a gas passing hole at a gas supply unit to prevent entry of charged particles in the plasma generated in the processing chamber into the gas supply unit. This structure makes it possible to fully prevent the entry of charged particles in the plasma generated inside the processing chamber into the gas supply unit.
Claims16
1-7. (canceled)
A plasma processing apparatus that executes plasma processing on a workpiece disposed inside a processing container, the plasma processing apparatus comprising:
- an electrode disposed inside the processing container;
- a sliding support member that slidably supports the electrode with a slide mechanism so as to allow the electrode to slide freely along any direction;
- a pneumatic cylinder having a rod disposed continuous to the sliding support member;
- a pneumatic circuit that drives the pneumatic cylinder;
- and
- a means for control that implements positional control of the electrode by controlling the pneumatic circuit.
An upper electrode unit of a plasma processing apparatus that executes plasma processing on a workpiece disposed inside a processing container, the upper electrode unit comprising:
- an upper electrode disposed inside the processing container;
- a sliding support member that slidably supports the upper electrode with a slide mechanism so as to allow the upper electrode to slide freely along any direction;
- a pneumatic cylinder having a rod disposed continuous to the sliding support member;
- a pneumatic circuit that drives the pneumatic cylinder;
- and
- a means for control that implements positional control of the upper electrode by controlling the pneumatic circuit.
Dependencies are inferred from the claim text.