Method and apparatus for photoimaging a substrate

A method comprising:

• providing a substrate comprising a carrier supporting a layer of photosensitive material;
• providing a mask comprising an image, the image comprising contiguous first, second, and third image portions;
• and sequentially:
• i) directing a light beam onto the mask such that it scans the first image portion along a first direction at a first rate and subsequently impinges on the layer of photosensitive material at an exposure zone while the substrate advances through the exposure zone along a second direction at a second rate;
• ii) directing the light beam onto the mask such that it impinges on the second image portion at a third rate and subsequently impinges on the layer of photosensitive material in the exposure zone while the substrate advances through the exposure zone along the second direction at a fourth rate;
• and
• iii) directing the light beam onto the mask such that it scans the third image portion along the first direction at a fifth rate and subsequently impinges on the layer of photosensitive material at the exposure zone while the substrate advances through the exposure zone along the second direction at a sixth rate, wherein the first rate and the fifth rate are greater than the third rate.