Negative resist composition and patterning process using the same
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsAkinobu Tanaka, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsAkinobu Tanaka, Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
Estimating the term…
There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2).
A negative resist composition comprising at least:
Dependencies are inferred from the claim text.