Film deposition method, film deposition apparatus, and gas barrier film
AssigneeFUJIFILM Corporation
InventorsTATSUYA FUJINAMI, MASATAKA HASEGAWA
Life of this patent
Estimating the term…
Abstract
A film deposition method comprises the steps of: transporting on a given transport path a long length of flexible film passed over a surface of a drum that is rotatably provided in a chamber evacuated to a given degree of vacuum; applying a radio-frequency voltage to a film deposition space created between a film deposition electrode and the surface of the drum to generate an electric field in the film deposition space; supplying a feed gas for film deposition into the film deposition space; and limiting an area where the feed gas is supplied so that an area where the electric field is generated in the film deposition space is large enough to cover the area where the feed gas is supplied.
Claims11
A film deposition method comprising the steps of:
- transporting on a given transport path a long length of flexible film passed over a surface of a drum that is rotatably provided in a chamber evacuated to a given degree of vacuum;
- applying a radio-frequency voltage to a film deposition space created between a film deposition electrode and the surface of the drum to generate an electric field in the film deposition space, the film deposition electrode being disposed opposite the surface of the drum through the intermediary of the flexible film passed over the drum with a distance from the surface of the drum;
- supplying a feed gas for film deposition into the film deposition space;
- and
- limiting an area where the feed gas is supplied so that an area where the electric field is generated in the film deposition space is large enough to cover the area where the feed gas is supplied.
A film deposition apparatus comprising:
- a chamber;
- an evacuation means for evacuating the chamber to a given degree of vacuum;
- a rotatable drum disposed in the chamber;
- a transport means for transporting a long length of flexible film passed over a surface of the drum on a given transport path;
- a film deposition electrode disposed opposite the surface of the drum through the intermediary of the flexible film passed over the drum with a distance from the surface of the drum so that a film deposition space is created between the surface of the drum and the film deposition electrode;
- an electric power supply means for applying a radio-frequency voltage between the film deposition electrode and the surface of the drum to generate an electric field in the film deposition space;
- a feed gas supply means for supplying a feed gas for film deposition into the film deposition space;
- and
- a limiting means for limiting an area where the feed gas is supplied by the feed gas supply means so that an area where the electric field is generated in the film deposition space is large enough to cover the area where the feed gas is supplied.
Dependencies are inferred from the claim text.