Methods and apparatuses for depositing nanometric filamentary structures
AssigneeInstitut National De La Recherche Scientifque
InventorsFrédéric Larouche, Olivier Smiljanic, Barry L. Stansfield
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AssigneeInstitut National De La Recherche Scientifque
InventorsFrédéric Larouche, Olivier Smiljanic, Barry L. Stansfield
Estimating the term…
The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for depositing the nanometric filamentary structures on at least one of the electrodes; and at least substantially preventing the deposited nanometric filamentary structures from bridging the electrodes during the deposition. The invention also relates to an apparatus for depositing nanometric filamentary structures as well as to methods and apparatuses for monitoring the production of nanometric filamentary structures.
A method for depositing nanometric filamentary structures, said method comprising:
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A method for depositing nanometric filamentary structures, said method comprising:
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An apparatus for depositing nanometric filamentary structures comprising:
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An apparatus for monitoring the production of nanometric filamentary structures, said apparatus comprising:
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